| 1. | The refractory metals and refractory metal silicides that are used to augment or replace the polysilicon are generally deposited by physical vapor deposition processes .
用于增强和取代多晶硅的难熔金属和难熔金属硅化物通常是用物理蒸发沉积工艺沉积的。 |
| 2. | Magnetic - field - aided plasma enhanced chemical vapor deposition
磁场辅助等离子体增强化学气相沉积 |
| 3. | Current situation and development trend of vapor deposition technology
气相沉积技术的现状与发展 |
| 4. | Cv chemical vapor deposition cv equipment
化学气相沉积法设备 |
| 5. | Cvd chemical vapor deposition equipment
化学气相沉积法设备 |
| 6. | Advance of optical chemical vapor deposition diamond thin films
化学气相沉积光学级金刚石薄膜的研究进展 |
| 7. | Generic specification of low pressure chemical vapor deposition system
低压化学气相淀积设备通用技术条件 |
| 8. | Phase composition and surface morphology of tic coating by chemical vapor deposition
涂层的相组成和表面形貌 |
| 9. | Vacuum chemical vapor deposition
真空化学汽相淀积 |
| 10. | Review of polishing techniques of diamond films grown by chemical vapor deposition
金刚石薄膜抛光技术的研究进展 |
